4n Nickel Ni Sputtering Target for Infrared Detectors Semiconductors

Nickel/Ni sputtering target features:Chemical Composition: pure NiAvailable Purity: 3N5-4N5Production Technology: EB meltingShapes: planar targets, rotary targetsAverage Grain Size: < 100um  Nickel Sputtering Target are produced by melting technology, it usually applied for infrared detectors and

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Nickel/Ni sputtering target features:

Chemical Composition: pure Ni

Available Purity: 3N5-4N5

Production Technology: EB melting

Shapes: planar targets, rotary targets

Average Grain Size: < 100um  


Nickel Sputtering Target are produced by melting technology, it usually applied for infrared detectors and magnetic data storage field. High purity nickel is usually applied for semiconductor field. With up to 5N purity, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

Company Profile:

Since 2014

Specializing in high purity sputtering targets.

Leader manufacturer of sputtering materials in China.

Qualified the world certificates such as ISO9001:2008 and SGS.

Comprehensive in R&D, manufacturing, and sales on thin film materials.

Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.

Electron Beam Evaporation Material Silver Granules with Best Price

OUR ADVANTAGE

1,Many years manufacturing & exporting experience.

2 Strict & complete QC systerm

3,Perfect after sale systerm

 
Electron Beam Evaporation Material Silver Granules with Best Price

COMPANY PROFILE:

Since 2014

Specializing in high purity sputtering targets.

Leader manufacturer of sputtering materials in China.

Qualified the world certificates such as ISO9001:2008 and SGS.

Comprehensive in R&D, manufacturing, and sales on thin film materials.

Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.

Gold Plate Sputtering Target for Magnetron Coating

OUR PRODUCTS     

*Metal Target : W, Mo, Ta, Nb, Cu, V, Ni, Ti, Fe, Al ,Zr, Co, Au, Ag, Pt, etc.

*Alloy Target : NiFe, NiCr, NiV, CuNi,TiAl, CoCr, CoFe, WTi, CoTaZr,CuInGa, ZnSn, CuZn, etc

*Ceramic Target : TiO2,Al2O3,Ta2O5, ZrO2,SiC,SiO,SiO2, ITO, GZO, AZO, WS2, MoS2,Ga2O3,HfO2,etc

*Evaporation Materials : Crucible, Pellets,Granules,Pieces,etc

*Backing Plate: Cu, Mo, SS,etc

*Bonding Service: Indium, Elastomer       
Gold Plate Sputtering Target for Magnetron Coating
                                      
 OUR ADVANTAGE


1,Many years manufacturing & exporting experience.

2 Strict & complete QC systerm

3,Perfect after sale systerm                                                   

Gold Plate Sputtering Target for Magnetron Coating 
PRODUCTION PROCESS
Gold Plate Sputtering Target for Magnetron Coating
PACKING & DELIVERY
 
Packaging Detail:

Inside: drying agent and vacuum sealed to prevent oxidization
Outside: wooden case to avoid damage during transportation

 

Delivery Detail:

Within 3-15 working days .
DHL, FedEx, UPS door to door service, 5-7 days from China to your country.
 

OUR CERTIFICATE

Gold Plate Sputtering Target for Magnetron Coating



Gold Plate Sputtering Target for Magnetron Coating
 
OUR FEEDBACK

4n Nickel Ni Sputtering Target for Infrared Detectors Semiconductors

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