99.95% Hafnium Sputtering Target for PVD Coating

                            Thin film coating material hafnium sputtering target   Product:  hafnium sputtering targetPurity:  99.95%Size:  customizedShape:  Planar Packing:  Vacumm sealed, wooden case  &n

Featured Products

                            Thin film coating material hafnium sputtering target 
  
Product:  hafnium sputtering target
Purity:  99.95%
Size:  customized
Shape:  Planar 
Packing:  Vacumm sealed, wooden case
     

Hafnium Sputtering Targets are produced by EB melting technology, with very lower zirconium content. It usually used for optical coating.

 

Features

Chemical Composition: pure Hf

Available Purity: 3N5

Production Technology: EB melting

Shapes: planar targets

Average Grain Size: < 100um  

 


Company Profile:

Since 2014

Specializing in high purity sputtering targets.

Leader manufacturer of sputtering materials in China.

Qualified the world certificates such as ISO9001:2008 and SGS.

Comprehensive in R&D, manufacturing, and sales on thin film materials.

Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.


99.95% Hafnium Sputtering Target for PVD Coating

OUR ADVANTAGE

1,Many years manufacturing & exporting experience.

2 Strict & complete QC systerm

3,Perfect after sale systerm

 
99.95% Hafnium Sputtering Target for PVD Coating


OUR SERVICE

Professional and efficient
We own a strong teamwork of professional R&D team,
manufacturing team, sales team and after-sales service team.
Provide you 12 hours fastest service.


 PRODUCTION PROCESS
99.95% Hafnium Sputtering Target for PVD Coating

99.95% Hafnium Sputtering Target for PVD Coating

99.95% Hafnium Sputtering Target for PVD Coating
99.95% Hafnium Sputtering Target for PVD Coating

Contact us

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