High Purity Metal Ag Silver Sputtering Target
Application: Mainly used for producing thin film,widely used in architecture and automotive coated glass industry, thin-film photovoltaic solar industry, TFT-LCD, electron industry.
Physical and Chemical Properties
Chemical Composition: Ag
Density: ≥99.99%
Purity:≥10.4g/cm3 (≥ 99%)
Machining Size
Customized according to customer requirements
Application: Mainly used for producing thin film,widely used in architecture and automotive coated glass industry, thin-film photovoltaic solar industry, TFT-LCD, electron industry.
Physical and Chemical Properties
Chemical Composition: Ag
Density: ≥99.99%
Purity:≥10.4g/cm3 (≥ 99%)
Machining Size
Customized according to customer requirements