High Purity 99.99% Nickel Ni Sputtering Target for Metal Thin Film Coating

High purity 99.99% Nickel Ni Sputtering Target for Metal Thin Film CoatingIntroductionThin film coating materials 99.99% Nickel sputtering targetProduct NameNickel (Ni)sputtering targetAvailable Purity(%)99.99(4N),99.995(4N5)ShapePlanar, roundSizeas your requestMelting point(ºC)1453Density(g/cm³)8.9Boiling po

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High Purity 99.99% Nickel Ni Sputtering Target for Metal Thin Film Coating

High purity 99.99% Nickel Ni Sputtering Target for Metal Thin Film Coating

Introduction

Thin film coating materials 99.99% Nickel sputtering target

Product Name

Nickel (Ni)sputtering target

Available Purity(%)

99.99(4N),99.995(4N5)

Shape

Planar, round

Size

as your request

Melting point(ºC)
1453
Density(g/cm³)

8.9

Boiling point(ºC)
2732
Technology
Vacuum Melting, Patented thermo-mechanical process and machine work
Application
Glass Coating & Decoration
 
High Purity 99.99% Nickel Ni Sputtering Target for Metal Thin Film CoatingHigh Purity 99.99% Nickel Ni Sputtering Target for Metal Thin Film Coating

High Purity 99.99% Nickel Ni Sputtering Target for Metal Thin Film Coating
High Purity 99.99% Nickel Ni Sputtering Target for Metal Thin Film Coating
High Purity 99.99% Nickel Ni Sputtering Target for Metal Thin Film Coating
High Purity 99.99% Nickel Ni Sputtering Target for Metal Thin Film Coating
High Purity 99.99% Nickel Ni Sputtering Target for Metal Thin Film Coating

PACKAGE:

     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.

     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.

     3 Responsible for the damage during the shipping process, will change the damage part for you for free.

DELIVERY TIME:15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity.

High Purity 99.99% Nickel Ni Sputtering Target for Metal Thin Film Coating
 

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