Thin film coating materials zinc/Zn sputtering target
Zinc Sputtering Target is produced by melting technology, normally used for depositing Znic oxide thin film, which can be luminescent film of LED and OLED products, or transparent conducting film of OLED products and anti-reflection film of thin-film solar cells. With up to 4N purity and special annealing treatment, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.
PRODUCTION PROCESS
Zinc Sputtering Target is produced by melting technology, normally used for depositing Znic oxide thin film, which can be luminescent film of LED and OLED products, or transparent conducting film of OLED products and anti-reflection film of thin-film solar cells. With up to 4N purity and special annealing treatment, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.
| Product: | zinc/Zn sputtering target |
| Purity: | 99.99% |
| Size: | customized |
| Shape: | Planar and rotary |
| Packing: | Vacumm sealed, wooden case |
PRODUCTION PROCESS