| Product: | antominy sputtering target |
| Purity: | 99.99% |
| Size: | customized |
| Shape: | Planar |
| Packing: | Vacumm sealed, wooden case |
Antominy sputtering target
Antimony Sputtering Targets are produced by melting or powder metallurgy technology, usually used for semiconductor field and R&D purpose.
Features
Chemical Composition: pure antimony
Available Purity: 4N, 5N
Production Technology: melting or powder metallurgy
Shapes: planar targets, 1" to 8" diameter
Company Profile:
Since 2014
Specializing in high purity sputtering targets.
Leader manufacturer of sputtering materials in China.
Qualified the world certificates such as ISO9001:2008 and SGS.
Comprehensive in R&D, manufacturing, and sales on thin film materials.
Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
OUR ADVANTAGE
1,Many years manufacturing & exporting experience.
2 Strict & complete QC systerm
3,Perfect after sale systerm
OUR SERVICE
Professional and efficient
We own a strong teamwork of professional R&D team,
manufacturing team, sales team and after-sales service team.
Provide you 12 hours fastest service.
PRODUCTION PROCESS
