Zirconium Tube Target, Pure Metal Material Zirconium Target for Magnetron Sputtering

Zirconium Sputtering TargetApplication: Mainly used for producing thin film, widely used in Decorative glass mirror film, PCB plate, TFT-LCD, Low-E glass film, semiconductor electronics.Physical and Chemical PropertiesChemical Composition: ZrMolding process: One batch formedPurity:   ≥6.4g/cm3(≥ 98%)Density:

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Zirconium Sputtering Target

Application: Mainly used for producing thin film, widely used in Decorative glass mirror film, PCB plate, TFT-LCD, Low-E glass film, semiconductor electronics.

Physical and Chemical Properties
Chemical Composition: Zr
Molding process: One batch formed
Purity:   ≥6.4g/cm3(≥ 98%)
Density:   ≥ 99.5%

Machining Size
Customized according to customer requirements

Zirconium Tube Target, Pure Metal Material Zirconium Target for Magnetron Sputtering

Zirconium Tube Target, Pure Metal Material Zirconium Target for Magnetron Sputtering
Zirconium Tube Target, Pure Metal Material Zirconium Target for Magnetron Sputtering
Zirconium Tube Target, Pure Metal Material Zirconium Target for Magnetron Sputtering
 

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