Researchers unravel the charge carrier dynamics of silicon oxide tunnel junctions

2021-12-14 10:55:51 By : Ms. Nancy Wang

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Liu Jia, Chinese Academy of Sciences

The team of Professor Ye Jichun from the Ningbo Institute of Materials Technology and Engineering (NIMTE) of the Chinese Academy of Sciences (CAS) and researchers from the University of Nottingham Ningbo, China revealed the potential dynamics of silicon oxide (SiOx) tunneling, including pinhole formation processes and electrical Load carrier transmission mechanism. The research was published in Cell Reports Physical Science.

As one of the most promising alternatives to reduce costs and increase equipment efficiency, the tunnel oxide passivation contact (TOPCon) technology has attracted considerable attention in the photovoltaic (PV) community. However, the core structure of TOPCon, that is, the physical mechanism of the polysilicon (poly-Si)/SiOx/crystalline silicon (c-Si) junction has not yet been elucidated, which limits the further improvement of device efficiency.

In order to solve this problem, NIMTE researchers conducted a large number of experiments and simulations to reveal the potential charge carrier dynamics of the SiOx tunnel junction.

Through detailed experiments, the formation process of pinholes was revealed, indicating that the interfacial stress caused by the mismatch of thermal expansion coefficient at high temperature may be the cause of the rupture of the SiOx film.

In addition, the simulation results provide direct evidence for the theory of charge carrier transport, proving that tunnel charge carrier transport and direct transport through pinholes work together. Which mechanism plays the leading role depends on the density and size of the pinholes and the thickness of SiOx.

In addition, considering passivation and contact behavior at the same time, a basic physical model with local pinholes was developed. The detailed current recombination analysis combined with the device efficiency prediction shows that the potential device efficiency can reach 27%.

This research on pinhole formation and charge carrier transport mechanism not only reveals the potential device physical characteristics of polysilicon/SiOx/c-Si junctions, but also releases high TOPCon device design efficiency, which is important for academic and industrial circles. Are all crucial. Further exploration of the double-sided contact solar cell has created a new world record of 26% efficiency. More information: Zhenhai Yang et al., The charge carrier dynamics of a silicon oxide tunnel junction mediated by local pinholes, Cell Reports Physical Science (2021 ). DOI: 10.1016/j.xcrp.2021.100667 Journal Information: Cell Report Physical Science

Citation provided by the Chinese Academy of Sciences: Researchers unravel the charge carrier dynamics of silicon oxide tunnel junctions (December 6, 2021) Retrieved on December 14, 2021 from https://phys.org/news/2021-12-unravel -carrier-dynamics-silicon -oxide.html This document is protected by copyright. Except for any fair transaction for private learning or research purposes, no part may be copied without written permission. The content is for reference only.

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