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Pure Tantalum Metal Sputtering Target. Pure Tantalum Round Target, Ta Target

Pure Tantalum Round TargetApplication: Mainly used for producing thin film, widely used in Decorative glass mirror film, PCB plate, TFT-LCD, Low-E glass film, semiconductor electronics.Physical and Chemical PropertiesChemical Composition: TaDensity:   ≥99.5%Machining SizeCustomized according to customer requirements
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Pure Tantalum Round Target

Application: Mainly used for producing thin film, widely used in Decorative glass mirror film, PCB plate, TFT-LCD, Low-E glass film, semiconductor electronics.

Physical and Chemical Properties
Chemical Composition: Ta
Density:   ≥99.5%

Machining Size
Customized according to customer requirements

Pure Tantalum Metal Sputtering Target. Pure Tantalum Round Target, Ta Target

Pure Tantalum Metal Sputtering Target. Pure Tantalum Round Target, Ta Target
Pure Tantalum Metal Sputtering Target. Pure Tantalum Round Target, Ta Target
Pure Tantalum Metal Sputtering Target. Pure Tantalum Round Target, Ta Target
 
Tantalum Carbide Tac Cz Single Silicon Wafers Lithium Borate Lutetium Oxide  Cadmium Manganese Telluride Cdmnte 5n Epitaxial Silicon Wafer High Purity Germanium Tungsten Carbide Titanium Oxide  Tantalum Ta Cadmium Telluride 5n

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